SPUTTER DEPTH PROFILING OF GAALAS DOUBLE HETEROSTRUCTURES USING AUGER-ELECTRON SPECTROSCOPY

被引：0

作者：

CHASSE, T ^{[1
]}

HEICHLER, W ^{[1
]}

LANGHAMMER, J ^{[1
]}

ZWANZIG, W ^{[1
]}

机构：

[1] UNIV HALLE,SEKT PHYS,DDR-4020 HALLE,GER DEM REP

来源：

CRYSTAL RESEARCH AND TECHNOLOGY | 1987年 / 22卷 / 11期

关键词：

D O I：

10.1002/crat.2170221114

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：1425 / 1429

页数：5

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