CORROSION FAILURE MECHANISMS FOR GOLD METALLIZATIONS IN ELECTRONIC CIRCUITS

被引:32
|
作者
FRANKENTHAL, RP [1 ]
BECKER, WH [1 ]
机构
[1] BELL TEL LABS INC, READING, PA 19604 USA
关键词
D O I
10.1149/1.2128783
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1718 / 1719
页数:2
相关论文
共 50 条
  • [31] SURVEY OF CORROSION FAILURE MECHANISMS IN MICROELECTRONIC DEVICES
    SCHNABLE, GL
    COMIZZOLI, RB
    KERN, W
    WHITE, LK
    RCA REVIEW, 1979, 40 (04): : 416 - 445
  • [32] Investigating the tarnish and corrosion mechanisms of Chinese gold coins
    Liang, Chenghao
    Yang, Changjiang
    Huang, Naibao
    SURFACE AND INTERFACE ANALYSIS, 2011, 43 (04) : 763 - 769
  • [33] Failure mechanisms of biomedical implants assisted by corrosion
    Staia, Mariana
    Machado, Julio
    Puchi, Eli
    Paiva, Rafael
    Revista de la Facultad de Ingenieria, 1998, 13 (01): : 57 - 63
  • [34] Analysis of failure mechanisms in the interconnect lines of microelectronic circuits
    Bower, AF
    Craft, D
    FATIGUE & FRACTURE OF ENGINEERING MATERIALS & STRUCTURES, 1998, 21 (05) : 611 - 630
  • [35] Some corrosion failure mechanisms of AMTEC cells
    Alger, DL
    IECEC-97 - PROCEEDINGS OF THE THIRTY-SECOND INTERSOCIETY ENERGY CONVERSION ENGINEERING CONFERENCE, VOLS 1-4: VOL.1: AEROSPACE POWER SYSTEMS AND TECHNOL; VOL 2: ELECTROCHEMICAL TECHNOL, CONVERSION TECHNOL, THERMAL MANAGEMENT; VOLS 3: ENERGY SYSTEMS, RENEWABLE ENERGY RESOURCES, ENVIRONMENTAL IMPACT, POLICY IMPACTS ON ENERGY; VOL 4: POST DEADLINE PAPERS, INDEX, 1997, : 1224 - 1229
  • [36] FAILURE MECHANISMS IN LARGE-SCALE INTEGRATED CIRCUITS
    SCHNABLE, GL
    KEEN, RS
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (04) : 322 - &
  • [37] Copper metallizations for integrated circuits: tem analysis and electrical characterization
    P. Bruschi
    C. Ciofi
    V. Dattilo
    A. Diligenti
    A. Nannini
    B. Neri
    Journal of Electronic Materials, 1997, 26 : L17 - L20
  • [38] Morphology of corrosion pits in aluminum thin film metallizations
    Proost, J
    Baklanov, M
    Verbeeck, R
    Maex, K
    JOURNAL OF SOLID STATE ELECTROCHEMISTRY, 1998, 2 (03) : 150 - 155
  • [39] ALLOYING OF GOLD AND GOLD ALLOY OHMIC CONTACT METALLIZATIONS WITH GALLIUM-ARSENIDE
    MILLER, DC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C147 - C147
  • [40] Copper metallizations for integrated circuits: TEM analysis and electrical characterization
    Bruschi, P
    Ciofi, C
    Dattilo, V
    Diligenti, A
    Nannini, A
    Neri, B
    JOURNAL OF ELECTRONIC MATERIALS, 1997, 26 (08) : L17 - L20