HIGH-VOLTAGE THIN-FILM TRANSISTORS MANUFACTURED WITH PHOTOLITHOGRAPHY AND WITH TA2O5 AS THE GATE OXIDE

被引：26
|
作者：
KALLFASS, T
LUEDER, E
机构：
来源：
THIN SOLID FILMS | 1979年 / 61卷 / 02期
关键词：
D O I：
10.1016/0040-6090(79)90469-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：259 / 264
页数：6
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