PROPERTIES OF SPUTTERED MOS2 FILMS

被引：0

作者：

BUCK, V ^{[1
]}

机构：

[1] DFVLR,INST TECH PHYS,D-7000 STUTTGART 80,FED REP GER

来源：

VAKUUM-TECHNIK | 1988年 / 37卷 / 04期

关键词：

Films; -; Morphology; Sputtering;

D O I：

暂无

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

The stoichiometry of sputtered MoS2 films depends mainly on the ratio of deposition rate of H2O-partial pressure during sputtering, where water is present in trace amounts. This variation of the stoichiometry causes changes of the morphology and of the lattice parameters of the films.

引用

页码：111 / 114

页数：4

共 50 条

[1] ELECTRICAL PROPERTIES OF SPUTTERED MOS2 FILMS
SOUDER, AD
BRODIE, DE
CANADIAN JOURNAL OF PHYSICS, 1972, 50 (21) : 2724 - &
[2] MORPHOLOGICAL PROPERTIES OF SPUTTERED MOS2 FILMS
BUCK, V
WEAR, 1983, 91 (03) : 281 - 288
[3] LUBRICATION WITH SPUTTERED MOS2 FILMS
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ASLE TRANSACTIONS, 1971, 14 (04): : 267 - &
[4] PREPARATION AND PROPERTIES OF DIFFERENT TYPES OF SPUTTERED MOS2 FILMS
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WEAR, 1987, 114 (03) : 263 - 274
[5] MORPHOLOGICAL GROWTH OF SPUTTERED MOS2 FILMS
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ASLE TRANSACTIONS, 1976, 19 (04): : 329 - 334
[6] Tribological properties of MoS2 films sputtered by argon and fluorocarbon mixture
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Nishimura, Makoto
JOURNAL OF JAPANESE SOCIETY OF TRIBOLOGISTS, 2007, 52 (02) : 148 - 155
[7] Tribological properties of MoS2 films sputtered by argon and fluorocarbon mixture
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Nishimura, Makoto
Toraibarojisuto/Journal of Japanese Society of Tribologists, 2007, 52 (02): : 148 - 155
[8] TRIBOLOGICAL PROPERTIES OF SPUTTERED MOS2 FILMS IN RELATION TO FILM MORPHOLOGY
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THIN SOLID FILMS, 1980, 73 (02) : 291 - 297
[9] CHEMICAL AND STRUCTURAL EFFECTS ON THE LUBRICATION PROPERTIES OF SPUTTERED MOS2 FILMS
FLEISCHAUER, PD
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TRIBOLOGY TRANSACTIONS, 1988, 31 (02): : 239 - 250
[10] CHEMICAL AND STRUCTURAL EFFECTS ON THE LUBRICATION PROPERTIES OF SPUTTERED MoS2 FILMS.
Fleischauer, Paul D.
Bauer, Reinhold
1988, 31 (02): : 239 - 250

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