MOSSBAUER STUDIES OF KR-83 IMPLANTED IN SEMICONDUCTORS AND METALS

被引：2
|
作者：
KEMERINK, GJ
BUKSHPAN, S
DEWAARD, H
机构：
来源：
HYPERFINE INTERACTIONS | 1979年 / 7卷 / 05期
关键词：
D O I：
10.1007/BF01021517
中图分类号：
O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号：
070203 ; 070304 ; 081704 ; 1406 ;
摘要：
引用
收藏
页码：339 / 351
页数：13
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