MOSSBAUER STUDIES OF KR-83 IMPLANTED IN SEMICONDUCTORS AND METALS

被引:2
|
作者
KEMERINK, GJ
BUKSHPAN, S
DEWAARD, H
机构
来源
HYPERFINE INTERACTIONS | 1979年 / 7卷 / 05期
关键词
D O I
10.1007/BF01021517
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
引用
收藏
页码:339 / 351
页数:13
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