ELECTRON-MICROSCOPY STUDY OF DEFECT STRUCTURES IN RECRYSTALLIZED AMORPHOUS LAYERS OF SELF-ION-IRRADIATED (111) SILICON

被引:33
|
作者
RECHTIN, MD [1 ]
PRONKO, PP [1 ]
FOTI, G [1 ]
CSEPREGI, L [1 ]
KENNEDY, EF [1 ]
MAYER, JW [1 ]
机构
[1] CALTECH,PASADENA,CA 91125
关键词
D O I
10.1080/01418617808239194
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:605 / 620
页数:16
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