FINE FOCUSED ION-BEAMS

被引:31
|
作者
SELIGER, RL
KUBENA, RL
WANG, V
机构
关键词
D O I
10.7567/JJAPS.21S1.3
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:3 / 10
页数:8
相关论文
共 50 条
  • [31] FOCUSED ION-BEAMS CUT AND PATCH IC WIRING
    BURSKY, D
    ELECTRONIC DESIGN, 1988, 36 (27) : 32 - 32
  • [32] MICROMACHINING OF SEMICONDUCTOR-MATERIALS BY FOCUSED ION-BEAMS
    KHAMSEHPOUR, B
    DAVIES, ST
    VACUUM, 1994, 45 (12) : 1169 - 1173
  • [33] NANOSTRUCTURE FABRICATION AND THE SCIENCE USING FOCUSED ION-BEAMS
    FUJISAWA, T
    BEVER, T
    HIRAYAMA, Y
    TARUCHA, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06): : 3755 - 3759
  • [34] SPACE-CHARGE EFFECTS IN FOCUSED ION-BEAMS
    YAU, YW
    GROVES, TR
    PEASE, RFW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1141 - 1144
  • [35] FOCUSED ION-BEAMS MICROFABRICATION METHODS AND APPLICATIONS (INVITED)
    PREWETT, PD
    VACUUM, 1993, 44 (3-4) : 345 - 351
  • [36] SI MOSFET FABRICATION USING FOCUSED ION-BEAMS
    KUBENA, RL
    LEE, JYM
    JULLENS, RA
    BRAULT, RG
    MIDDLETON, PL
    STEVENS, EH
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1984, 31 (09) : 1186 - 1189
  • [37] MASKLESS ETCHING OF A NANOMETER STRUCTURE BY FOCUSED ION-BEAMS
    KOMURO, M
    HIROSHIMA, H
    TANOUE, H
    KANAYAMA, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 985 - 989
  • [38] SCANNING PROBE TIPS FORMED BY FOCUSED ION-BEAMS
    VASILE, MJ
    GRIGG, DA
    GRIFFITH, JE
    FITZGERALD, EA
    RUSSELL, PE
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1991, 62 (09): : 2167 - 2171
  • [39] ULTRA FINE FINISHING OF DIAMOND TOOLS BY ION-BEAMS
    MIYAMOTO, I
    PRECISION ENGINEERING-JOURNAL OF THE AMERICAN SOCIETY FOR PRECISION ENGINEERING, 1987, 9 (02): : 71 - 78
  • [40] FORMATION OF PROBE MICROSCOPE TIPS IN SILICON BY FOCUSED ION-BEAMS
    VASILE, MJ
    BIDDICK, C
    HUGGINS, H
    APPLIED PHYSICS LETTERS, 1994, 64 (05) : 575 - 576