PROPERTIES OF RF SPUTTERED HYDROGENATED AMORPHOUS GERMANIUM-SILICON ALLOYS

被引:18
|
作者
BANERJEE, PK [1 ]
DUTTA, R [1 ]
MITRA, SS [1 ]
PAUL, DK [1 ]
机构
[1] HARVARD UNIV,GORDON MCKAY LAB,CAMBRIDGE,MA 02138
关键词
D O I
10.1016/0022-3093(82)90194-6
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1 / 11
页数:11
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