USE OF MOIRE PATTERNS IN HOLOGRAPHIC INTERFEROMETRY OF HIGH SENSITIVITY

被引：0
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作者：
MUSTAFIN, KS
SELEZNEV, VA
机构：
来源：
OPTIKA I SPEKTROSKOPIYA | 1972年 / 32卷 / 03期
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中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
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页码：400 / &
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