NEW LENSES FOR MICROLITHOGRAPHY

被引：0

作者：

GLATZEL, E ^{[1
]}

机构：

[1] MATH ABT,D-7082 OBERKOCHEN,FED REP GER

来源：

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA | 1980年 / 70卷 / 08期

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：1041 / 1041

页数：1

共 50 条

[1] Measurement of astigmatism in microlithography lenses
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[J]. OPTICAL MICROLITHOGRAPHY XI, 1998, 3334 : 848 - 854
[2] NEW MATERIALS FOR OPTICAL MICROLITHOGRAPHY
MILLER, RD
MACDONALD, SA
[J]. JOURNAL OF IMAGING SCIENCE, 1987, 31 (02): : 43 - 46
[3] New generation projection optics for microlithography
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Kato, T
[J]. OPTICAL MICROLITHOGRAPHY XIV, PTS 1 AND 2, 2001, 4346 : 595 - 605
[4] NEW DEEP ULTRAVIOLET SOURCE FOR MICROLITHOGRAPHY
URY, MG
MATTHEWS, JC
WOOD, CH
[J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1982, 334 : 241 - 247
[5] NEW MATERIALS FOR OPTICAL MICROLITHOGRAPHY.
Miller, R.D.
MacDonald, S.A.
[J]. Journal of imaging science, 1987, 31 (02): : 43 - 46
[6] OPTIMIZATION PARAMETERS OF COMBINED MAGNETIC LENSES AND DEFLECTION SYSTEM FOR ELECTRON-BEAM MICROLITHOGRAPHY
DECHAMBOST, E
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C152 - C152
[7] Development of new advanced resist materials for microlithography
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[J]. JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2008, 21 (04) : 475 - 491
[8] A NEW NEGATIVE RESIST FOR DEEP UV MICROLITHOGRAPHY
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LEONARD, RF
[J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 394 : 162 - 171
[9] A NEW HIGH-PERFORMANCE NEGATIVE PHOTORESIST FOR MICROLITHOGRAPHY
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[J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 539 : 242 - 248
[10] MICROLITHOGRAPHY
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[J]. OPTICAL ENGINEERING, 1993, 32 (10) : 2327 - 2327

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