A NEW NEGATIVE RESIST FOR DEEP UV MICROLITHOGRAPHY

被引：0
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作者：
TOUKHY, MA
LEONARD, RF
机构：
来源：
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1983年 / 394卷
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中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
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页码：162 / 171
页数：10
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