3-MASK SELF-ALIGNED MOS TECHNOLOGY

被引:0
|
作者
MAI, CC [1 ]
CHAN, TC [1 ]
PALMER, RB [1 ]
机构
[1] MOSTEK CORP,WORCESTER,MA 01606
关键词
D O I
10.1109/T-ED.1973.17813
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1162 / 1164
页数:3
相关论文
共 50 条
  • [1] LOW-RESISTANCE MOS TECHNOLOGY USING SELF-ALIGNED REFRACTORY SILICIDATION
    OKABAYASHI, H
    MORIMOTO, M
    NAGASAWA, E
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1984, 31 (09) : 1329 - 1334
  • [2] DEPLETION LOAD SELF-ALIGNED TECHNOLOGY
    BOREL, J
    BERNARD, J
    SUAT, JP
    SOLID-STATE ELECTRONICS, 1973, 16 (12) : 1377 - 1381
  • [3] NEW SELF-ALIGNED CONTACT TECHNOLOGY
    TANIGAKI, Y
    IWAMATSU, S
    HIROBE, K
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : 471 - 472
  • [4] A self-aligned double-gate MOS transistor technology with individually addressable gates
    Zhang, SD
    Lin, XN
    Huang, R
    Han, RQ
    Ko, PK
    Wang, YY
    Chan, MS
    2002 IEEE INTERNATIONAL SOI CONFERENCE, PROCEEDINGS, 2002, : 207 - 208
  • [5] SELF-ALIGNED MOLYBDENUM GATE MOS-FETS
    SINGH, A
    INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 1981, 19 (08) : 707 - 710
  • [6] SELF-ALIGNED MOLYBDENUM GATE MOS-FETs.
    Singh, Awatar
    Indian Journal of Pure and Applied Physics, 1981, 19 (08): : 707 - 710
  • [7] SELF-ALIGNED SILICIDES FOR MOS AND BIPOLAR-DEVICES
    AMANO, J
    HUANG, M
    ROSNER, J
    TURNER, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (03) : C133 - C133
  • [8] POLYSILICON OXIDATION SELF-ALIGNED MOS (POSA MOS) - A NEW SELF-ALIGNED DOUBLE SOURCE DRAIN ION-IMPLANTATION TECHNIQUE FOR VLSI
    HSIA, S
    FATEMI, R
    TENG, TC
    DEORNELLAS, S
    SUN, SC
    SKINNER, C
    ELECTRON DEVICE LETTERS, 1982, 3 (02): : 40 - 42
  • [9] A NEW SELF-ALIGNED FRAMED MASK METHOD FOR SELECTIVE OXIDATION
    MINEGISHI, K
    IMAI, K
    KIUCHI, K
    HIRATA, K
    YORIUME, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (01) : 55 - 61
  • [10] Self-aligned phase shifting mask for contact hole fabrication
    Todokoro, Y.
    Watanabe, H.
    Hirai, Y.
    Nomura, N.
    Inoue, M.
    Proceedings of the International Conference on Microlithography, 1991,