INFLUENCE OF THE PRIMARY ION-BEAM ON THE DEPTH DISTRIBUTION OF IMPLANTED ATOMS MEASURED BY SIMS

被引：2
|
作者：
SIELANKO, J
机构：
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1989年 / 112卷 / 01期
关键词：
D O I：
10.1002/pssa.2211120137
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
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页码：319 / 322
页数：4
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