ION-BEAM ANALYSIS FOR DEPTH PROFILING

被引：18
|
作者：
KNAPP, JA
BARBOUR, JC
DOYLE, BL
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1992年 / 10卷 / 04期
关键词：
D O I：
10.1116/1.577959
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
New techniques in the application of ion beam analysis to depth profiling in solids are briefly surveyed. These include (1) non-Rutherford backscattering analysis using high energy beams, (2) resonant nuclear reaction analysis, (3) time-of-flight elastic recoil detection spectrometry, and (4) heavy ion backscattering spectrometry. The last can be used for very precise depth profiling in one configuration, or as a very sensitive trace contaminant analysis in another configuration.
引用
收藏
页码：2685 / 2690
页数：6
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