STRUCTURE OF CHROMIUM THIN-FILMS PREPARED BY PLASMA DEPOSITION

被引：4
|
作者：
AGARWAL, V [1 ]
VANKAR, VD [1 ]
CHOPRA, KL [1 ]
机构：
[1] INDIAN INST TECHNOL,CTR MAT SCI & TECHNOL,NEW DELHI 110016,INDIA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 04期
关键词：
D O I：
10.1116/1.575586
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2341 / 2343
页数：3
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