STRUCTURE OF CHROMIUM THIN-FILMS PREPARED BY PLASMA DEPOSITION

被引：4

作者：

AGARWAL, V ^{[1
]}

VANKAR, VD ^{[1
]}

CHOPRA, KL ^{[1
]}

机构：

[1] INDIAN INST TECHNOL,CTR MAT SCI & TECHNOL,NEW DELHI 110016,INDIA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 04期

关键词：

D O I：

10.1116/1.575586

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2341 / 2343

页数：3

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