MASK MAKING IN BALI

被引：0
|
作者：
BROOKE, M
机构：
来源：
ARTS OF ASIA | 1980年 / 10卷 / 02期
关键词：
D O I：
暂无
中图分类号：
J [艺术];
学科分类号：
13 ; 1301 ;
摘要：
引用
收藏
页码：100 / 105
页数：6
相关论文
共 50 条
  • [41] MASK MAKING FOR SYNCHROTRON RADIATION LITHOGRAPHY.
    Ehrfeld, W.
    Glashauser, W.
    Muenchmeyer, D.
    Schelb, W.
    Microelectronic Engineering, 1986, 5 (1-4) : 463 - 470
  • [42] RECREATION AND MORALE VII. MASK MAKING
    Stone, Mark L.
    BULLETIN OF THE MENNINGER CLINIC, 1942, 6 (03) : 84 - 86
  • [43] Application of a wafer development process to mask making
    Lee, G
    Berger, C
    Bürgel, C
    Feicke, A
    Cantrell, R
    Tschinkl, M
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XII, PTS 1 AND 2, 2005, 5853 : 445 - 453
  • [44] UNMASKING THE METHOD: MASK MAKING AS A RESEARCH TOOL
    Jesuvadian, Mercy Karuniah
    EDULEARN11: 3RD INTERNATIONAL CONFERENCE ON EDUCATION AND NEW LEARNING TECHNOLOGIES, 2011, : 1481 - 1490
  • [45] Improved pattern placement in membrane mask making
    Perkins, K
    Marrian, C
    Peckerar, M
    16TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT, 1996, 2884 : 344 - 352
  • [46] MEETING NEW MASK-MAKING NEEDS
    MORAN, JM
    RUTH, RL
    BELL LABORATORIES RECORD, 1979, 57 (07): : 192 - 198
  • [47] SUBMICRON MASK-MAKING BY ELECTRON BEAM
    SAITOU, N
    NONOGAKI, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (03) : C105 - &
  • [48] Can textile materials be used for making reusable face mask - A solution to disposable mask?
    Kan, Chi-wai
    Yip, Joanne Yiu-wan
    Chiou, Jiachi
    Yung, Ka-fu
    ASIA-PACIFIC JOURNAL OF CLINICAL ONCOLOGY, 2022, 18 : 102 - 102
  • [49] Impact of mask line edge roughness and statistical noise on next generation mask making
    Kim, Byung Gook
    Choi, Jin
    Lee, Sang Hee
    Jeon, Chan Uk
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIX, 2012, 8441
  • [50] What’s behind the mask?Mask-making technique in psychodrama groups for children
    Virág Szikora
    Zeitschrift für Psychodrama und Soziometrie, 2023, 22 (Suppl 2) : 427 - 433
12345