PLASMA-ETCHING OF MATERIALS FOR SEMICONDUCTOR STRUCTURES AND DEVICES

被引：0
|
作者：
GULDAN, A [1 ]
LUBY, S [1 ]
HRKUT, P [1 ]
KUBEK, J [1 ]
机构：
[1] SLOVAK ACAD SCI, ELEKTROTECH USTAV, CS-80932 BRATISLAVA, CZECHOSLOVAKIA
来源：
CESKOSLOVENSKY CASOPIS PRO FYSIKU SEKCE A | 1979年 / 29卷 / 05期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
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页码：468 / +
页数：1
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