STUDIES OF PLASMA-ETCHING MECHANISMS WITH CANTILEVER STRUCTURES

被引：0

作者：

REYNOLDS, JL ^{[1
]}

NOLLINS, J ^{[1
]}

NEUREUTHER, AR ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,ELECTR RES LAB,BERKELEY,CA 94720

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C84 / C84

页数：1

共 50 条

[1] BASIC MECHANISMS IN PLASMA-ETCHING
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KERSTEN, H
RUTSCHER, A
[J]. CONTRIBUTIONS TO PLASMA PHYSICS, 1989, 29 (03) : 263 - 284
[2] PLASMA-ETCHING - A DISCUSSION OF MECHANISMS
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[J]. CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1981, 10 (02): : 119 - 141
[3] PLASMA-ETCHING - DISCUSSION OF MECHANISMS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 391 - 403
[4] BASIC CHEMISTRY AND MECHANISMS OF PLASMA-ETCHING
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (01): : 23 - 30
[5] MECHANISTIC STUDIES OF OXYGEN PLASMA-ETCHING
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 1892 - 1895
[6] PLASMA-ETCHING OF SILYLATED PHOTORESIST - A STUDY OF MECHANISMS
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[7] PLASMA-ETCHING OF MATERIALS FOR SEMICONDUCTOR STRUCTURES AND DEVICES
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LUBY, S
HRKUT, P
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[J]. CESKOSLOVENSKY CASOPIS PRO FYSIKU SEKCE A, 1979, 29 (05): : 468 - +
[8] APPLICATION OF PLASMA-ETCHING TO MULTILEVEL METAL STRUCTURES
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : C375 - C375
[9] PLASMA-ETCHING
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[J]. ACS SYMPOSIUM SERIES, 1983, 219 : 215 - 285
[10] ANISOTROPIC ETCHING OF SUBMICRONIC RESIST STRUCTURES BY RESONANT INDUCTIVE PLASMA-ETCHING
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