INSITU MULTIDIMENSIONAL OBSERVATION OF MASKLESSLY IMPLANTED SITES USING MEV HEAVY-ION MICROPROBES

被引:0
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作者
MOKUNO, Y
HORINO, Y
CHAYAHARA, A
KIUCHI, M
FUJII, K
SATOU, M
TAKAI, M
机构
[1] OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
[2] OSAKA UNIV,EXTREME MAT RES CTR,TOYONAKA,OSAKA 560,JAPAN
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中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A multi-dimensional structure consisting of two masklessly implanted regions of gold was successfully fabricated into a silicon wafer by 0.6 MeV Au+ and 1.8 MeV Au2+ ion microbeams and this structure was analyzed in-situ by a 3 MeV C2+ ion microprobe. The three-dimensional distribution of gold atoms was observed by complete three-dimensional Rutherford backscattering spectrometry (RBS) mapping and the change in surface condition was clearly observed by ion induced secondary electron (SE) imaging, The advantages of the three-dimensional RBS mapping method have been shown.
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页码:373 / 377
页数:5
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