INTERFACIAL REACTIONS BETWEEN METAL AND GALLIUM-ARSENIDE

被引：35

|

作者：

LIN, JC

SCHULZ, KJ

HSIEH, KC

CHANG, YA

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 10期

关键词：

D O I：

10.1149/1.2096392

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：3006 / 3010

页数：5

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