ION-BEAM TECHNIQUES IN THIN-FILM DEPOSITION

The importance of ion bombardment in thin film deposition has long been recognized. Plasma-based processes such as rf bias sputtering, magnetron sputtering, and plasma enhanced CVD show pronounced changes in film properties as the degree of ion bombardment of the growing film is varied. Recently, ion beam techniques have been developed which provide quantitative information on the importance of ion energy, ion flux, and the ratio of arrival rates of ions to film atoms. Several ion beam techniques are reviewed and examples are given of property modification which can be achieved by controlled ion bombardment.