SURFACE ETCHING BY LASER-GENERATED FREE-RADICALS

被引:45
|
作者
STEINFELD, JI [1 ]
ANDERSON, TG [1 ]
REISER, C [1 ]
DENISON, DR [1 ]
HARTSOUGH, LD [1 ]
HOLLAHAN, JR [1 ]
机构
[1] PERKIN ELMER CORP,ULTEK DIV,MT VIEW,CA 94043
关键词
D O I
10.1149/1.2129698
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:514 / 515
页数:2
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