SURFACE ETCHING BY LASER-GENERATED FREE-RADICALS

被引：45
|
作者：
STEINFELD, JI [1 ]
ANDERSON, TG [1 ]
REISER, C [1 ]
DENISON, DR [1 ]
HARTSOUGH, LD [1 ]
HOLLAHAN, JR [1 ]
机构：
[1] PERKIN ELMER CORP,ULTEK DIV,MT VIEW,CA 94043
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 02期
关键词：
D O I：
10.1149/1.2129698
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：514 / 515
页数：2
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