KINETICS OF STRUCTURAL RELAXATION AND HYDROGEN EVOLUTION FROM PLASMA DEPOSITED SILICON-NITRIDE

被引：46
|
作者：
BUDHANI, RC
BUNSHAH, RF
FLINN, PA
机构：
[1] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305
[2] INTEL CORP,SANTA CLARA,CA 95051
来源：
APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 04期
关键词：
D O I：
10.1063/1.99495
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：284 / 286
页数：3
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