THERMAL ANNEALING OF EXCIMER-LASER-INDUCED DEFECTS IN VIRGIN SILICON

被引：6
|
作者：
HARTITI, B
SLAOUI, A
MULLER, JC
SIFFERT, P
机构：
来源：
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1989年 / 4卷 / 1-4期
关键词：
D O I：
10.1016/0921-5107(89)90252-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：257 / 260
页数：4
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