THE ROLE OF VAPOR ETCHING IN THE GROWTH OF EPITAXIAL INP

被引:13
|
作者
ASHEN, DJ
ANDERSON, DA
APSLEY, N
EMENY, MT
机构
关键词
D O I
10.1016/0022-0248(82)90093-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:225 / 234
页数:10
相关论文
共 50 条
  • [1] ROLE OF ETCHING IN EPITAXIAL-GROWTH OF SILICON
    RAO, PVS
    VARKER, CJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (08) : C256 - C256
  • [2] INP ETCHING BY REACTIVE ION ETCHING METHANE-CHARACTERIZATION OF SURFACE AND EPITAXIAL-GROWTH
    HENRY, L
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1990, 45 (251): : 141 - 141
  • [3] VAPOR-PHASE EPITAXIAL-GROWTH AND CHARACTERIZATION OF INP ON GAAS
    TENG, SJJ
    BALLINGALL, JM
    ROSENBAUM, FJ
    APPLIED PHYSICS LETTERS, 1986, 48 (18) : 1217 - 1219
  • [4] VAPOR GROWTH OF THIN HETERO-EPITAXIAL INP FILMS ON CDS
    INUISHI, M
    WESSELS, BW
    THIN SOLID FILMS, 1982, 88 (03) : 195 - 202
  • [5] EPITAXIAL-GROWTH OF CD-DOPED INP FROM THE VAPOR
    CHEVRIER, J
    HORACHE, E
    GOLDSTEIN, L
    LINH, NT
    JOURNAL OF APPLIED PHYSICS, 1982, 53 (04) : 3247 - 3251
  • [6] Metalorganic vapor-phase epitaxial growth and characterization of vertical InP nanowires
    Bhunia, S
    Kawamura, T
    Watanabe, Y
    Fujikawa, S
    Tokushima, K
    APPLIED PHYSICS LETTERS, 2003, 83 (16) : 3371 - 3373
  • [7] VAPOR-PHASE EPITAXIAL-GROWTH OF INGAAS ON (100) INP SUBSTRATE
    SUSA, N
    YAMAUCHI, Y
    ANDO, H
    KANBE, H
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (01) : L17 - L20
  • [8] EPITAXIAL-GROWTH ON INP SUBSTRATES ETCHED WITH METHANE REACTIVE ION ETCHING TECHNIQUE
    HENRY, L
    VAUDRY, C
    LECORRE, A
    LECROSNIER, D
    ALNOT, P
    OLIVIER, J
    ELECTRONICS LETTERS, 1989, 25 (18) : 1257 - 1259
  • [9] ELUCIDATION OF THE ORGANOMETALLIC VAPOR-PHASE EPITAXIAL-GROWTH MECHANISM FOR INP
    BUCHAN, NI
    LARSEN, CA
    STRINGFELLOW, GB
    APPLIED PHYSICS LETTERS, 1987, 51 (13) : 1024 - 1026
  • [10] Chlorine auto-doping by chloride vapor phase epitaxial growth of InP
    Iwasaki, T
    Iguchi, Y
    Yamabayashi, N
    Yoneyama, S
    JOURNAL OF ELECTRONIC MATERIALS, 1996, 25 (03) : 463 - 466