A SMALL MULTICATHODE MAGNETRON FOR DEPOSITING MULTILAYER THIN-FILM COATINGS

被引：0
|
作者：
BUDISHEVSKII, VS
YANKELEVICH, EB
机构：
来源：
INSTRUMENTS AND EXPERIMENTAL TECHNIQUES | 1994年 / 37卷 / 02期
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The magnetron can be used to sputter three materials both concurrently and separately. At a target-substrate separation of 100-120 mm, the deviation in the film thickness over an area with a diameter of 40 mm is less than 5% and with a diameter of 76 mm it is less than 10%. Under argon at a pressure of 0.5-0.8 Pa and a discharge current of 0.1-0.5 A each cathode unit provides a deposition rate of 0.05-0.2 mum/min. By selecting the magnetic system configuration and dimensions of the target, we reached an efficiency of 35-40%.
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页码：244 / 246
页数：3
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