Multilayer Thin-Film Capacitors Fabricated by Radio-Frequency Magnetron Sputtering

被引:0
|
作者
Imamiya, Yuji [1 ]
Yokokawa, Ryuji [1 ]
Kanno, Isaku [1 ]
Kotera, Hidetoshi [1 ]
机构
[1] Kyoto Univ, Dept Micro Engn, Kyoto, Japan
关键词
component; Suputtering; BT thin films; Multilayer ceramic capacitor; DIELECTRIC-PROPERTIES; CERAMIC CAPACITORS; SUPERLATTICES;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this study, we fabricate multilayer ceramic capacitors (MLCCs) composed of BaTiO3 (BT) dielectric layers with Pt internal electrodes by radio frequency magnetron sputtering. We deposited BT layers with thickness of approximately 300 nm on Pt/Ti-coated SiO2/Si substrates through a movable shadow mask. The isolated internal Pt electrodes are prepared by sliding the shadow mask. Multilayered BT thin films are uniformly deposited on a Si substrate with external electrodes on both sides of the BT films. The formation of a polycrystalline perovskite structure was confirmed by XRD measurement. The MLCCs with five BT layers exhibit excellent dielectric properties: a relative dielectric constant of approximately 320 and a dielectric loss of around 2% regardless of the number of dielectric layers.
引用
收藏
页数:4
相关论文
共 50 条
  • [1] Multilayer Thin-Film Capacitor Fabricated by Radio-Frequency Magnetron Sputtering
    Imamiya, Yuji
    Kanno, Isaku
    Yokokawa, Ryuji
    Kotera, Hidetoshi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (09)
  • [2] Thin-film transistors based on ZnO fabricated by using radio-frequency magnetron sputtering
    Navamathavan, R
    Lim, JH
    Hwang, DK
    Kim, BH
    Oh, JY
    Yang, JH
    Kim, HS
    Park, SJ
    Jang, JH
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2006, 48 (02) : 271 - 274
  • [3] Electrochemical catalysis of aluminum diboride thin film fabricated by radio-frequency magnetron sputtering
    Nashimoto, Kazuki
    Horiguchi, Yoshiko
    Kumatani, Akichika
    Okada, Takeru
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2024, 63 (04)
  • [4] ELECTRICAL AND DIELECTRIC-PROPERTIES OF THIN-FILM BATIO3 CAPACITORS DEPOSITED BY RADIO-FREQUENCY MAGNETRON SPUTTERING
    SHI, ZQ
    JIA, QX
    ANDERSON, WA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04): : 733 - 736
  • [5] PREPARATION OF STRONTIUM-TITANATE THIN-FILM ON SI SUBSTRATE BY RADIO-FREQUENCY MAGNETRON SPUTTERING
    CHO, NH
    NAM, SH
    KIM, HG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (01): : 87 - 91
  • [6] Thin-film deposition of Cu2O by reactive radio-frequency magnetron sputtering
    Ishizuka, S
    Maruyama, T
    Akimoto, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2000, 39 (8A): : L786 - L788
  • [7] Thin film transistors based on TiO2 fabricated by using radio-frequency magnetron sputtering
    Shih, W. S.
    Young, S. J.
    Ji, L. W.
    Water, W.
    Meen, T. H.
    Lam, K. T.
    Sheen, J.
    Chu, W. C.
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2010, 71 (12) : 1760 - 1762
  • [8] Low-Temperature-Processed SiInZnO Thin-Film Transistor Fabricated by Radio Frequency Magnetron Sputtering
    Kim B.K.
    Lee S.Y.
    Transactions on Electrical and Electronic Materials, 2018, 19 (3) : 218 - 221
  • [9] Radio-frequency magnetron sputtering and wet thermal oxidation of ZnO thin film
    Liu, H. F.
    Chua, S. J.
    Hu, G. X.
    Gong, H.
    Xiang, N.
    JOURNAL OF APPLIED PHYSICS, 2007, 102 (04)
  • [10] Copper nitride thin film prepared by reactive radio-frequency magnetron sputtering
    Yue, G.H.
    Yan, P.X.
    Liu, J.Z.
    Wang, M.X.
    Li, M.
    Yuan, X.M.
    Journal of Applied Physics, 2005, 98 (10):