MASKLESS ETCHING OF AL USING FOCUSED ION-BEAM

被引：6
|
作者：
OCHIAI, Y
SHIHOYAMA, K
SHIOKAWA, T
TOYODA, K
MASUYAMA, A
GAMO, K
NAMBA, S
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1986年 / 25卷 / 07期
关键词：
D O I：
10.1143/JJAP.25.L526
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L526 / L529
页数：4
相关论文
共 50 条
  • [21] ION-BEAM ETCHING
    GLOERSEN, PG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 28 - 35
  • [22] PRESSURE AND IRRADIATION ANGLE DEPENDENCE OF MASKLESS ION-BEAM ASSISTED ETCHING OF GAAS AND SI
    OCHIAI, Y
    GAMO, K
    NAMBA, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 67 - 70
  • [23] THE CHARACTERISTICS OF ION-BEAM-ASSISTED ETCHING OF GAAS BY PULSED FOCUSED ION-BEAM IRRADIATION
    KOSUGI, T
    IWASE, H
    GAMO, K
    MICROELECTRONIC ENGINEERING, 1993, 21 (1-4) : 307 - 310
  • [24] DRY LITHOGRAPHY USING FOCUSED ION-BEAM IMPLANTATION AND REACTIVE ION ETCHING OF SIO2
    CHOQUETTE, KD
    HARRIOTT, LR
    APPLIED PHYSICS LETTERS, 1993, 62 (25) : 3294 - 3296
  • [25] Formation of integrated nanosized graphene structures by focused ion-beam etching
    Bobrinetskii I.I.
    Gorshkov K.V.
    Nevolin V.K.
    Tsarik K.A.
    Nanotechnologies in Russia, 2010, 5 (5-6): : 313 - 319
  • [26] FOCUSED ION-BEAM USING A TRIODE GUN
    KOMURO, M
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C110 - C110
  • [27] RECENT PROGRESS ON ETCHING TECHNOLOGY WITH FOCUSED ION-BEAM IN PHOTOMASK REPAIR
    NAKAGAWA, Z
    SASAKI, S
    SATO, M
    GLANVILLE, J
    YAMAMOTO, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (03): : 1030 - 1031
  • [28] 100 KEV FOCUSED ION-BEAM SYSTEM WITH A EXB MASS FILTER FOR MASKLESS ION-IMPLANTATION
    SHIOKAWA, T
    KIM, PH
    TOYODA, K
    NAMBA, S
    MATSUI, T
    GAMO, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1117 - 1120
  • [29] Maskless ion implantation of cerium by focused ion beam
    Kagami, Manabu
    Shiokawa, Takao
    Segawa, Yuzaburo
    Aoyagi, Yoshinobu
    Namba, Susumu
    Okada, Hiroshi
    Ito, Toshio
    Japanese Journal of Applied Physics, Part 2: Letters, 1988, 27 pt 2 (06):
  • [30] FABRICATION OF MICROSTRUCTURES FOR QUANTUM DEVICES USING FOCUSED ION-BEAM GAS-ASSISTED ETCHING
    OCHIAI, Y
    YOUNG, RJ
    CLEAVER, JRA
    AHMED, H
    BABA, T
    MICROELECTRONIC ENGINEERING, 1991, 13 (1-4) : 399 - 402
12345