MIXING OF PHOSPHORUS AND ANTIMONY IONS IN SILICON BY RECOIL IMPLANTATION

被引：3
|
作者：
KWOK, HL
LAM, YW
WONG, SP
POON, MC
机构：
来源：
JOURNAL OF MATERIALS SCIENCE LETTERS | 1986年 / 5卷 / 06期
关键词：
D O I：
10.1007/BF01731532
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
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页码：633 / 634
页数：2
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