CHARACTERIZATION OF REACTIVELY MAGNETRON SPUTTERED HYDROGENATED AMORPHOUS-SILICON FILMS

被引:0
|
作者
RUBEL, H
SCHRODER, B
GEIGER, J
机构
来源
关键词
D O I
暂无
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1855 / 1860
页数:6
相关论文
共 50 条
  • [1] PROPERTIES OF MAGNETRON SPUTTERED HYDROGENATED AMORPHOUS-SILICON
    STEIN, HJ
    PEERCY, PS
    PECKERAR, M
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 1981, 10 (04) : 797 - 810
  • [2] EFFECT OF DEPOSITION TEMPERATURE ON THE PROPERTIES OF MAGNETRON SPUTTERED HYDROGENATED AMORPHOUS-SILICON FILMS
    BANERJEE, R
    DAS, D
    BATABYAL, AK
    BARUA, AK
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (08): : 1320 - 1322
  • [3] LIGHT-INDUCED-CHANGES IN MAGNETRON-SPUTTERED HYDROGENATED AMORPHOUS-SILICON FILMS
    DAS, D
    BANERJEE, R
    BATABYAL, AK
    BARUA, AK
    [J]. THIN SOLID FILMS, 1988, 164 : 227 - 231
  • [4] ELEMENTAL ANALYSIS OF SPUTTERED HYDROGENATED AMORPHOUS-SILICON FILMS
    PATTERSON, AM
    CRAVEN, AJ
    CHAPMAN, JN
    LONG, AR
    [J]. INSTITUTE OF PHYSICS CONFERENCE SERIES, 1983, (68): : 429 - 432
  • [5] ELECTRONIC STABILITY OF THE REACTIVELY SPUTTERED HYDROGENATED AMORPHOUS-SILICON THIN-FILMS - THE EFFECT OF HYDROGEN CONTENT
    PINARBASI, M
    KUSHNER, MJ
    ABELSON, JR
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 1369 - 1373
  • [6] REDUCED STAEBLER-WRONSKI EFFECT IN REACTIVELY SPUTTERED HYDROGENATED AMORPHOUS-SILICON THIN-FILMS
    PINARBASI, M
    ABELSON, JR
    KUSHNER, MJ
    [J]. APPLIED PHYSICS LETTERS, 1990, 56 (17) : 1685 - 1687
  • [7] MAGNETORESISTANCE IN SPUTTERED HYDROGENATED AMORPHOUS-SILICON
    KUIVALAINEN, P
    HELESKIVI, J
    LEPPIHALME, M
    GYLLENBERGGASTRIN, U
    [J]. PHYSICA SCRIPTA, 1982, 25 (06): : 832 - 834
  • [8] HYDROGENATED AMORPHOUS-SILICON FILMS PRODUCED BY DC MAGNETRON TECHNIQUE
    KOLODZIEJ, A
    LEJA, E
    [J]. ACTA PHYSICA POLONICA A, 1987, 71 (03) : 497 - 499
  • [9] MAGNETRON-SPUTTERED AMORPHOUS-SILICON
    DEMICHELIS, F
    TAGLIAFERRO, A
    TRESSO, E
    RAVA, P
    [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (12) : 5424 - 5427
  • [10] EFFECT OF LIGHT SOAKING TEMPERATURE ON THE METASTABLE DEFECT DISTRIBUTION IN MAGNETRON SPUTTERED HYDROGENATED AMORPHOUS-SILICON FILMS
    BANDYOPADHYAY, AK
    BANERJEE, R
    BATABYAL, AK
    BARUA, AK
    OKUSHI, H
    TANAKA, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1989, 28 (10): : L1704 - L1707