XPS STUDY OF THE OXIDATION OF A CU-CD THIN-FILM

被引：2
|
作者：
DICASTRO, V [1 ]
POLZONETTI, G [1 ]
CONTINI, G [1 ]
机构：
[1] CNR,INST MINERAL PROC,I-00138 ROME,ITALY
来源：
SURFACE SCIENCE | 1991年 / 251卷
关键词：
D O I：
10.1016/0039-6028(91)91104-6
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The oxidation of a Cu-Cd thin film obtained by coevaporation of the two metals has been studied by XPS. The oxygen is initially adsorbed on the alloy surface, afterwards the Cd component is oxidized to CdO, while the Cu component remains unchanged also at high exposure of O2 (6 X 10(8) L). The Cu/Cd atomic ratio decreases during the oxidation reaction, in agreement with the formation of a CdO layer onto the alloy surface. The thickness of the oxidized layer has been quantified as a function of O2 exposure.
引用
收藏
页码：814 / 818
页数：5
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