APPLICATION AND CONTROL OF ION ETCHING PROCESSES IN RF-SPUTTER UNITS

被引：0
|
作者：
BOEHNKE, RD [1 ]
机构：
[1] PHILIPS GMBH,FORSCH LAB HAMBURG,D-2000 HAMBURG 54,FED REP GER
来源：
VAKUUM-TECHNIK | 1976年 / 25卷 / 07期
关键词：
D O I：
暂无
中图分类号：
TH [机械、仪表工业];
学科分类号：
0802 ;
摘要：
引用
收藏
页码：195 / 199
页数：5
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