PROCESSING ENHANCED SEU TOLERANCE IN HIGH-DENSITY SRAMS

被引：7
|
作者：
FU, JS
LEE, KH
KOGA, R
KOLANSKI, WA
WEAVER, HT
BROWNING, JS
机构：
[1] AT&T BELL LABS,ALLENTOWN,PA 18103
[2] AEROSPACE CORP,EL SEGUNDO,CA 90245
来源：
IEEE TRANSACTIONS ON NUCLEAR SCIENCE | 1987年 / 34卷 / 06期
关键词：
D O I：
10.1109/TNS.1987.4337473
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1322 / 1325
页数：4
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