DIFFUSION AND DRIFT OF SI DOPANTS IN DELTA-DOPED N-TYPE ALXGA1-XAS

被引：60
|
作者：
SCHUBERT, EF
TU, CW
KOPF, RF
KUO, JM
LUNARDI, LM
机构：
来源：
APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 25期
关键词：
D O I：
10.1063/1.101059
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2592 / 2594
页数：3
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