DEPOSITION AND PROPERTIES OF DIAMOND THIN-FILMS

被引:5
|
作者
KLAGES, CP
机构
[1] Fraunhofer-Institut für Schicht- und Oberflächentechnik, W-2000 Hamburg 54
关键词
D O I
10.1016/0921-5093(91)90506-I
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Owing to a combination of several excellent intrinsic properties, diamond is the ideal material for a wide range of technical applications, from cutting tool coatings to high power, high temperature semiconductor devices. More than 20 years after Eversole's demonstration of the feasibility of diamond growth under conditions of thermodynamic metastability, intensive world-wide research activities emerged, aiming at the development and improvement of processes for the deposition of diamond thin films. This paper ives a short account of the important deposition methods known at present and discusses, as examples, several film properties and applications.
引用
收藏
页码:741 / 746
页数:6
相关论文
共 50 条
  • [1] NUCLEATION AND SELECTIVE DEPOSITION OF DIAMOND THIN-FILMS
    POPOVICI, G
    PRELAS, MA
    [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1992, 132 (02): : 233 - 252
  • [2] PLASMA PROPERTIES OF A HYDROCARBON ARCJET USED IN THE PLASMA DEPOSITION OF DIAMOND THIN-FILMS
    STALDER, KR
    SHARPLESS, RL
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 68 (12) : 6187 - 6190
  • [3] MICROWAVE CVD DEPOSITION OF DIAMOND THIN-FILMS WITH APPLICATIONS
    YEHODA, JE
    GUARNIERI, CR
    WHITEHAIR, SJ
    CUOMO, JJ
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 202 : 92 - PHYS
  • [4] MECHANICAL-PROPERTIES OF DIAMOND THIN-FILMS
    BULL, SJ
    CHALKER, PR
    JOHNSTON, C
    [J]. MATERIALS SCIENCE AND TECHNOLOGY, 1992, 8 (08) : 679 - 684
  • [5] FRICTION AND WEAR PROPERTIES OF THIN-FILMS OF CARBON WITH DIAMOND STRUCTURE PREPARED BY IONIZED DEPOSITION
    OKADA, K
    NAMBA, Y
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (02): : 132 - 135
  • [6] MECHANICAL-PROPERTIES OF DIAMOND THIN-FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION
    SEINO, Y
    HIDA, N
    NAGAI, S
    [J]. JOURNAL OF MATERIALS SCIENCE LETTERS, 1992, 11 (08) : 515 - 517
  • [7] DEPOSITION AND CHARACTERIZATION OF DIAMOND EPITAXIAL THIN-FILMS ON SILICON SUBSTRATES
    JIANG, X
    KLAGES, CP
    ROSLER, M
    ZACHAI, R
    HARTWEG, M
    FUSSER, HJ
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1993, 57 (06): : 483 - 489
  • [8] GROWTH OF DIAMOND THIN-FILMS BY CHEMICAL-VAPOR-DEPOSITION
    KULKARNI, AK
    [J]. BULLETIN OF MATERIALS SCIENCE, 1994, 17 (07) : 1379 - 1391
  • [9] VAPOR-DEPOSITION OF DIAMOND THIN-FILMS ON VARIOUS SUBSTRATES
    LEE, YH
    BACHMANN, KJ
    GLASS, JT
    LEGRICE, YM
    NEMANICH, RJ
    [J]. APPLIED PHYSICS LETTERS, 1990, 57 (18) : 1916 - 1918
  • [10] VACUUM DEPOSITION PROCESSES AND THE PROPERTIES OF THIN-FILMS
    GUENTHER, KH
    [J]. PLATING AND SURFACE FINISHING, 1994, 81 (04): : 68 - 71