LOW-ENERGY HYDROGEN-ION BOMBARDMENT DAMAGE IN SILICON - AN INSITU OPTICAL INVESTIGATION

被引：8
|
作者：
COLLINS, RW
CAVESE, JM
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 05期
关键词：
D O I：
10.1116/1.574310
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2797 / 2803
页数：7
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