RETARDING-FIELD OPTICS FOR PRACTICAL ELECTRON-BEAM LITHOGRAPHY

被引:0
|
作者
NEWMAN, TH
PEASE, RFW
机构
关键词
D O I
暂无
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
引用
收藏
页码:25 / 30
页数:6
相关论文
共 50 条
  • [1] VERY-LOW-ENERGY ELECTRON-BEAM LITHOGRAPHY USING A RETARDING-FIELD
    ISHII, K
    MATSUDA, T
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1990, 29 (10): : 2212 - 2215
  • [2] SPACE-CHARGE EFFECTS IN CONVENTIONAL AND IN RETARDING-FIELD ELECTRON-BEAM SYSTEMS
    YAU, YW
    PEASE, RFW
    GROVES, TR
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C112 - C112
  • [3] PRACTICAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY
    LIVESAY, WR
    [J]. SOLID STATE TECHNOLOGY, 1984, 27 (02) : 109 - 109
  • [4] IMPROVED RETARDING-FIELD OPTICS VIA IMAGE OUTSIDE FIELD
    HORDON, LS
    BOYER, BB
    PEASE, RFW
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (03): : 826 - 832
  • [5] ELECTRON OPTICS FOR HIGH THROUGHPUT ELECTRON-BEAM LITHOGRAPHY SYSTEM
    SOHDA, Y
    NAKAYAMA, Y
    SAITOU, N
    ITOH, H
    TODOKORO, H
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 2940 - 2943
  • [6] APPLICATION OF FIELD-EMISSION IN HIGH-CURRENT ELECTRON-BEAM LITHOGRAPHY OPTICS
    VENEKLASEN, L
    YEW, N
    WIESNER, J
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C151 - C151
  • [7] MEBES IV THERMAL-FIELD EMISSION TANDEM OPTICS FOR ELECTRON-BEAM LITHOGRAPHY
    GESLEY, M
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 2949 - 2954
  • [8] RETARDING-FIELD OSCILLATORS
    EBERS, JJ
    [J]. PROCEEDINGS OF THE INSTITUTE OF RADIO ENGINEERS, 1952, 40 (02): : 138 - 145
  • [9] ELECTRON-BEAM LITHOGRAPHY
    HERRIOTT, DR
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 781 - 785
  • [10] ELECTRON-BEAM LITHOGRAPHY
    EVERHART, TE
    [J]. BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1977, 22 (03): : 276 - 276