共 50 条
- [31] A HIGH-SPEED, HIGH-PRECISION ELECTRON-BEAM LITHOGRAPHY SYSTEM (ELECTRON OPTICS) [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 98 - 101
- [32] CONSTRUCTION OF A RETARDING-FIELD ENERGY ANALYZER [J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1977, 10 (03): : 287 - 292
- [34] COULOMB EFFECTS IN RETARDING-FIELD LENSES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06): : 3489 - 3493
- [37] RESIST CHARGING IN ELECTRON-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (05): : 1979 - 1983
- [38] ELECTRON-BEAM LITHOGRAPHY FOR MICROCIRCUIT FABRICATION [J]. ELECTRONICS AND POWER, 1976, 22 (07): : 433 - 436
- [39] ELECTRON-BEAM LITHOGRAPHY ERROR SOURCES [J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 471 : 2 - 7
- [40] POLYDIALLYLORTHOPHTHALATE RESIST FOR ELECTRON-BEAM LITHOGRAPHY [J]. POLYMER ENGINEERING AND SCIENCE, 1980, 20 (16): : 1110 - 1114