GROWTH AND CHARACTERIZATION STUDIES OF FE4N THIN-FILMS PREPARED BY ION-BEAM-ASSISTED EVAPORATION

被引：17
|
作者：
CHATBI, H
VERGNAT, M
BAUER, P
MARCHAL, G
机构：
来源：
APPLIED PHYSICS LETTERS | 1995年 / 67卷 / 03期
关键词：
D O I：
10.1063/1.114622
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Thin films of iron nitrides have been prepared using an ion beam assisted evaporation method. X-ray diffraction and Mossbauer spectrometry show that the films generally consist in a mixture of Fe and Fe4N phases. For high source powers and temperatures higher than 300 degrees C it was possible to obtain the pure Fe4N phase. (C) 1995 American Institute of Physics.
引用
收藏
页码：430 / 432
页数：3
相关论文
共 50 条
  • [1] ION-BEAM-ASSISTED DEPOSITION OF THIN-FILMS
    SMIDT, FA
    JOURNAL OF METALS, 1987, 39 (10): : A92 - A92
  • [2] ION-BEAM-ASSISTED DEPOSITION OF THIN-FILMS
    MARTIN, PJ
    MACLEOD, HA
    NETTERFIELD, RP
    PACEY, CG
    SAINTY, WG
    APPLIED OPTICS, 1983, 22 (01): : 178 - 184
  • [3] ION-BEAM-ASSISTED DEPOSITION OF TIN THIN-FILMS
    KUBOTA, H
    CHEN, JS
    NAGATA, M
    KOLAWA, E
    NICOLET, MA
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (08): : 3414 - 3419
  • [4] A NEXAFS CHARACTERIZATION OF ION-BEAM-ASSISTED CARBON-SPUTTERED THIN-FILMS
    JAOUEN, M
    TOURILLON, G
    DELAFOND, J
    JUNQUA, N
    HUG, G
    DIAMOND AND RELATED MATERIALS, 1995, 4 (03) : 200 - 206
  • [5] A REVIEW OF ION-BEAM-ASSISTED DEPOSITION OF OPTICAL THIN-FILMS
    MOHAN, S
    KRISHNA, MG
    VACUUM, 1995, 46 (07) : 645 - 659
  • [6] Epitaxial Growth and Magnetic Characterization of γ′-Fe4N Thin Films
    Atiq, S.
    Siddiqi, S. A.
    Ko, H. S.
    Riaz, S.
    Naseem, S.
    Shin, S. C.
    2015 IEEE MAGNETICS CONFERENCE (INTERMAG), 2015,
  • [7] OXIDATION OF TIN THIN-FILMS IN AN ION-BEAM-ASSISTED DEPOSITION PROCESS
    KUBOTA, H
    NAGATA, M
    MIYAGAWA, R
    NICOLET, MA
    APPLIED SURFACE SCIENCE, 1994, 82-3 : 565 - 568
  • [8] STRUCTURE AND MAGNETIC-PROPERTIES OF FE-N FILMS PREPARED BY ION-BEAM-ASSISTED DEPOSITION
    JIANG, H
    WU, QL
    TAO, K
    LI, HD
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (05) : 3299 - 3302
  • [9] CHARACTERIZATION OF ALUMINUM FILMS DEPOSITED BY ION-BEAM-ASSISTED ULTRAHIGH-VACUUM EVAPORATION
    DIETZ, V
    EHRHART, P
    GUGGI, D
    HAUBOLD, HG
    JAGER, W
    PRIELER, M
    SCHILLING, W
    SURFACE & COATINGS TECHNOLOGY, 1990, 43-4 (1-3): : 963 - 974
  • [10] ION-BEAM-ASSISTED DEPOSITION OF AL2O3 THIN-FILMS
    BHATTACHARYA, RS
    RAI, AK
    MCCORMICK, AW
    SURFACE & COATINGS TECHNOLOGY, 1991, 46 (02): : 155 - 163
12345