ANNEALING OF FATIGUED COPPER IN ELECTRON-MICROSCOPE

被引：1

作者：

GONZALEZ, R ^{[1
]}

PIQUERAS, J ^{[1
]}

BRU, L ^{[1
]}

机构：

[1] UNIV COMPLUTENSE, FAC CIEN, DEPT FIS FUNDAMENTAL, MICROSCOPIA ELECTR LAB, MADRID, SPAIN

来源：

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 1976年 / 34卷 / 01期

关键词：

D O I：

10.1002/pssa.2210340145

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：K9 / +

页数：1

共 50 条

[1] ELECTRON-MICROSCOPE TRANSMISSION ELECTRON-MICROSCOPE AND SCANNING ELECTRON-MICROSCOPE
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[J]. DENKI KAGAKU, 1986, 54 (08): : 667 - 670
[2] IN-SITU TRANSMISSION ELECTRON-MICROSCOPE INVESTIGATION OF ANNEALING OF COPPER PRECIPITATE COLONIES IN SILICON
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[J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (01) : 486 - 487
[3] ELECTRON-MICROSCOPE STUDY OF EXPLOSIVELY LOADED COPPER
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[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (08) : 2506 - &
[4] SCANNING ELECTRON-MICROSCOPE ATTACHMENT FOR ELECTRON-MICROSCOPE
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[J]. JOURNAL OF ELECTRON MICROSCOPY, 1972, 21 (03): : 256 - 256
[5] AN ELECTRON-MICROSCOPE INVESTIGATION OF ELECTROLYTIC COPPER POWDERS
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[J]. JOURNAL OF APPLIED ELECTROCHEMISTRY, 1981, 11 (02) : 177 - 185
[6] HIGH-PURE COPPER RECRYSTALLIZATION DURING ANNEALING IN HIGH-VOLTAGE ELECTRON-MICROSCOPE
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[J]. FIZIKA METALLOV I METALLOVEDENIE, 1979, 48 (02): : 367 - 374
[7] APPARATUS FOR ANNEALING OF ELECTRON-MICROSCOPE SPECIMENS UNDER CONTROLLED ATMOSPHERES
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RONANDER, E
[J]. JOURNAL OF MICROSCOPY-OXFORD, 1975, 103 (MAR): : 179 - 185
[8] ELECTRON-MICROSCOPE
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[J]. JOURNAL OF JAPAN SOCIETY OF LUBRICATION ENGINEERS, 1985, 30 (03): : 177 - 180
[9] ELECTRON-MICROSCOPE STUDIES OF NATURE OF DEFECT CLUSTERS IN COPPER
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[J]. JOURNAL OF NUCLEAR MATERIALS, 1978, 69-7 (1-2) : 830 - 831
[10] NUCLEATION AND GROWTH OF SILICIDES STUDIED BY INSITU ANNEALING IN A TRANSMISSION ELECTRON-MICROSCOPE
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[J]. VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1987, 42 (236): : 75 - 77

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