RAMAN-SPECTROSCOPIC STUDY OF NB/ALOX-AL/NB JOSEPHSON-JUNCTIONS

被引：2
|
作者：
MOROHASHI, S
机构：
[1] Fujitsu Laboratories Ltd, Atsugi, 243-01
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1994年 / 33卷 / 2A期
关键词：
NB/ALOX-AL/NB JOSEPHSON JUNCTION; RAMAN SPECTROSCOPY;
D O I：
10.1143/JJAP.33.L170
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We have studied the AlOx barrier composition of niobium (Nb) Josephson junctions with a Nb/AlOx-Al/Nb structure using Raman spectroscopy at 10 K. We have observed both Al-O and Al-OH modes of an AlOx barrier with a few nm thickness in the Raman spectra through Nh counter electrode. For a structure annealed at 300 degrees C, the Al-O mode intensity increases and the Al-OH mode intensity decreases. This contributes to a change in the critical current of the junction after annealing.
引用
收藏
页码：L170 / L172
页数：3
相关论文
共 50 条
  • [21] ULTRAHIGH-SPEED LOGIC GATE FAMILY WITH NB/AL-ALOX/NB JOSEPHSON-JUNCTIONS
    KOTANI, S
    FUJIMAKI, N
    IMAMURA, T
    HASUO, S
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1986, 33 (03) : 379 - 384
  • [22] Sub-gap leakage in Nb/AlOx/Nb and Al/AlOx/Al Josephson junctions
    Gubrud, MA
    Ejrnaes, M
    Berkley, AJ
    Ramos, RC
    Jin, I
    Anderson, JR
    Dragt, AJ
    Lobb, CJ
    Wellstood, FC
    [J]. IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 2001, 11 (01) : 1002 - 1005
  • [23] HIGH-QUALITY NB/AL-ALOX-AL/NB JOSEPHSON-JUNCTIONS BY ELECTRON-BEAM EVAPORATION
    JANAWADKAR, MP
    BASKARAN, R
    GIREESAN, K
    SAHA, R
    VAIDYANATHAN, LS
    RADHAKRISHNAN, TS
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1994, 33 (12A): : L1662 - L1664
  • [24] SECONDARY ION MASS-SPECTROMETRY STUDY FOR JOSEPHSON JUNCTION WITH NB/ALOX-AL/NB STRUCTURE
    MOROHASHI, S
    KATAOKA, Y
    IMAMURA, T
    HASUO, S
    [J]. APPLIED PHYSICS LETTERS, 1993, 62 (10) : 1164 - 1166
  • [25] APPLICATION OF SPUTTERED SIO2 INSULATOR TO NB/ALOX/NB JOSEPHSON-JUNCTIONS
    HOKO, H
    IMAMURA, T
    OHARA, S
    HASUO, S
    [J]. JOURNAL OF APPLIED PHYSICS, 1987, 62 (08) : 3432 - 3435
  • [26] AN IMPROVED ETCHING PROCESS USED FOR THE FABRICATION OF SUBMICRON NB/ALOX/NB JOSEPHSON-JUNCTIONS
    AOYAGI, M
    MAEZAWA, M
    NAKAGAWA, H
    KUROSAWA, I
    TAKADA, S
    [J]. IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 1995, 5 (02) : 2334 - 2337
  • [27] Thermal annealing of Nb/Al-AlOx/Nb Josephson junctions
    Migacz, JV
    Huber, ME
    [J]. IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 2003, 13 (02) : 123 - 126
  • [28] RESISTIVE MEASUREMENT OF THE TEMPERATURE-DEPENDENCE OF THE PENETRATION DEPTH OF NB IN NB/ALOX/NB JOSEPHSON-JUNCTIONS
    KIM, DH
    GRAY, KE
    HETTINGER, JD
    KANG, JH
    CHOI, SS
    [J]. JOURNAL OF APPLIED PHYSICS, 1994, 75 (12) : 8163 - 8167
  • [29] ELLIPSOMETRIC STUDY OF NB-AL-ALOX LAYERED STRUCTURE FOR ALL-REFRACTORY JOSEPHSON-JUNCTIONS
    TANABE, K
    ASANO, H
    MICHIKAMI, O
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1986, 25 (02): : 183 - 188
  • [30] Nb/AlOx-Al/Nb Josephson junction fabricated using facing target sputtering system
    Morohashi, S
    Ikuta, M
    Yamashita, N
    Miyoshi, T
    Takada, Y
    [J]. PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, 2005, 426 : 1519 - 1524
12345