POLYSILICON DRY ETCHING BY A LARGE-AREA ELECTRON-BEAM

被引：1
|
作者：
DU, YC [1 ]
WANG, H [1 ]
SUN, DC [1 ]
LI, FM [1 ]
机构：
[1] FUDAN UNIV,DEPT PHYS,SHANGHAI,PEOPLES R CHINA
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 45卷 / 02期
关键词：
D O I：
10.1007/BF02565205
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：165 / 168
页数：4
相关论文
共 50 条
  • [1] POLYSILICON DRY ETCHING BY A LARGE-AREA ELECTRON BEAM.
    Du, Y.C.
    Wang, H.
    Sun, D.C.
    Li, F.M.
    [J]. Applied physics. A, Solids and surfaces, 1988, A45 (02): : 165 - 168
  • [2] LARGE-AREA ELECTRON-BEAM SOURCE
    LIVESAY, WR
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2304 - 2314
  • [3] Stability of large-area electron-beam diodes
    Friedman, M
    Swanekamp, S
    Obenschain, S
    Chan, Y
    Ludeking, L
    Smithe, D
    [J]. APPLIED PHYSICS LETTERS, 2000, 77 (07) : 1053 - 1055
  • [4] RAPID REMOVAL FOR PHOTORESIST BY A LARGE-AREA ELECTRON-BEAM
    SUN, DC
    YU, ZQ
    LI, FM
    DU, YC
    WANG, H
    [J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (11) : 5180 - 5182
  • [5] Electron-beam writing of large-area Fresnel zone plates
    Watanabe, T
    Okada, T
    Kinoshita, H
    [J]. JOURNAL OF SYNCHROTRON RADIATION, 1998, 5 : 791 - 793
  • [6] ELECTRON-BEAM LITHOGRAPHY FOR LARGE-AREA PATTERNING .3. DATA CONVERSION AND ELECTRON-BEAM DEFLECTION CONTROL
    HOSHINOUCHI, S
    TOBUSE, H
    MURAKAMI, H
    SHIMIZU, R
    [J]. SCANNING MICROSCOPY, 1993, 7 (01) : 49 - 55
  • [7] RAPID MODIFICATION OF THIN-FILMS BY A LARGE-AREA ELECTRON-BEAM
    DU, YC
    WANG, H
    JIANG, GB
    SUN, DC
    YU, ZQ
    LI, FM
    [J]. THIN SOLID FILMS, 1988, 163 : 349 - 357
  • [8] Numerical modeling of large-area electron-beam diodes for KrF lasers
    [J]. Rose, D.V. (drose@mrcabq.com), 1600, American Institute of Physics Inc. (94):
  • [9] Numerical modeling of large-area electron-beam diodes for KrF lasers
    Rose, DV
    Welch, DR
    Hegeler, F
    Swanekamp, SB
    Myers, MC
    Sethian, JD
    [J]. JOURNAL OF APPLIED PHYSICS, 2003, 94 (08) : 5343 - 5349
  • [10] DRY ETCHING UTILIZING SHOWERED ELECTRON-BEAM ASSISTED ETCHING
    MATSUI, S
    WATANABE, H
    [J]. MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 337 - 340
12345