POLYSILICON DRY ETCHING BY A LARGE-AREA ELECTRON-BEAM

被引：1
|
作者：
DU, YC [1 ]
WANG, H [1 ]
SUN, DC [1 ]
LI, FM [1 ]
机构：
[1] FUDAN UNIV,DEPT PHYS,SHANGHAI,PEOPLES R CHINA
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 45卷 / 02期
关键词：
D O I：
10.1007/BF02565205
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：165 / 168
页数：4
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