ATOMIC-STRUCTURE AT THE COSI2/SI-LESS-THAN-GREATER-THAN-111-LESS-THAN-GREATER-THAN-INTERFACE

被引:0
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作者
CATANA, A [1 ]
RIEUBLAND, S [1 ]
SCHMID, PE [1 ]
STADELMANN, P [1 ]
机构
[1] SWISS FED INST TECHNOL, INST ELECTRON MICROSCOPY, CH-1015 LAUSANNE, SWITZERLAND
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中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
HRTEM has been used to investigate structural changes at the cobalt silicide/silicon interface. The samples were prepared by annealing of a UHV evaporated Co layer at 400, 500 and 900-degrees-C. Extensive image calculations have been used to study the atomic configuration at the CoSi2/Si interface. Experimental images were obtained on both thin foils and cleaved samples. The second technique is used for the first time in the case of a silicide/silicon system. Comparison between experimental images and calculated models show evidence for the 7-fold coordination of the first Co layer.
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页码:621 / 626
页数:6
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