STRUCTURAL EFFECTS ON A SUB-MICRON TRENCH PROCESS

被引：63

作者：

CHIN, DJ

DHONG, SH

LONG, GJ

机构：

来源：

关键词：

D O I：

10.1149/1.2114195

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1705 / 1707

页数：3

共 50 条

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[32] SUB-MICRON LITHOGRAPHY TECHNIQUES
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[33] Designing in deep sub-micron
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[34] Sub-micron accuracy with EDM
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[35] SUB-MICRON OPTICAL LITHOGRAPHY
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[36] SUB-MICRON INTERPLANETARY DUST
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[39] SUB-MICRON IDT FABRICATION
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[40] TRANSPORT IN SUB-MICRON DEVICES
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