THE ROLE OF TRANSITION-METAL IMPURITIES IN SCHOTTKY-BARRIER FORMATION

被引：0
|
作者：
LUDEKE, R [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
JOURNAL OF ELECTRONIC MATERIALS | 1986年 / 15卷 / 05期
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D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：310 / 310
页数：1
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