THE ROLE OF TRANSITION-METAL IMPURITIES IN SCHOTTKY-BARRIER FORMATION

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作者：

LUDEKE, R ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1986年 / 15卷 / 05期

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中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

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页码：310 / 310

页数：1

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